The preparation of SiC ceramic photosensitive slurry for rapid stereolithography

doi:10.1016/j.jeurceramsoc.2021.08.029

CASIA OpenIR > 多模态人工智能系统全国重点实验室 > 平行智能技术与系统团队

	The preparation of SiC ceramic photosensitive slurry for rapid stereolithography
	Tang, Jie 1,2; Guo, Xiaotian 1,2; Chang, Haotian 1,2; Hu, Kehui 3,4; Shen, Zhen5 ; Wang, Weixing ; Liu, Meng1,2 ; Wei, Yuquan 1,2; Huang, Zhengren 1,2; Yang, Yong1,2
发表期刊	JOURNAL OF THE EUROPEAN CERAMIC SOCIETY
ISSN	0955-2219
	2021-12-01
卷号	41 期号:15 页码:7516-7524
通讯作者	Huang, Zhengren(zhrhuang@mail.sic.ac.cn) ; Yang, Yong(yangyong@mail.sic.ac.cn)
摘要	Stereolithography is one of the most widely used additive manufacturing techniques for preparing high precision and complex ceramic components. Due to the high optical absorbance and refractive index of SiC powder, the rapid stereolithography of SiC ceramics components has become a key challenge. Here, we innovatively use graded silica to improve the curing thickness, rheological and settling performance of the slurry. And we presented a preparation method of SiC ceramic slurry for stereolithography with high solid content, low viscosity, low sedimentation rate and high curing thickness. The printable precision of the slurry is more than 75 mu m, the dynamic viscosity is less than 2 Pa.s, and the 24 h sedimentation height is less than 5%. This strategy demonstrates a tantalizing possibility and promising prospect to rapid stereolithography of large size SiC ceramic green body.
关键词	Stereolithography Graded SiO2 3D printing SiC ceramic slurry
DOI	10.1016/j.jeurceramsoc.2021.08.029
关键词[WOS]	MATRIX COMPOSITES ; FABRICATION ; INFILTRATION ; SUSPENSIONS ; BEHAVIOR ; SPACE
收录类别	SCI
语种	英语
资助项目	Research instrument development project of Chinese Academy of Sciences[YZQT014]
项目资助者	Research instrument development project of Chinese Academy of Sciences
WOS研究方向	Materials Science
WOS类目	Materials Science, Ceramics
WOS记录号	WOS:000705188500005
出版者	ELSEVIER SCI LTD
七大方向——子方向分类	人工智能+制造
引用统计	被引频次：45[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.ia.ac.cn/handle/173211/46168
专题	多模态人工智能系统全国重点实验室_平行智能技术与系统团队
通讯作者	Huang, Zhengren; Yang, Yong
作者单位	1.Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine, Shanghai 200050, Peoples R China 2.Univ Chinese Acad Sci, Coll Mat Sci & Optoelect Technol, Beijing 100049, Peoples R China 3.Tsinghua Univ, State Key Lab Tribol, Beijing 100084, Peoples R China 4.Tsinghua Univ, Dept Mech Engn, Beijing 100084, Peoples R China 5.Chinese Acad Sci, Inst Automat, State Key Lab Management & Control Complex Syst, Beijing, Peoples R China
推荐引用方式 GB/T 7714	Tang, Jie,Guo, Xiaotian,Chang, Haotian,et al. The preparation of SiC ceramic photosensitive slurry for rapid stereolithography[J]. JOURNAL OF THE EUROPEAN CERAMIC SOCIETY,2021,41(15):7516-7524.
APA	Tang, Jie.,Guo, Xiaotian.,Chang, Haotian.,Hu, Kehui.,Shen, Zhen.,...&Yang, Yong.(2021).The preparation of SiC ceramic photosensitive slurry for rapid stereolithography.JOURNAL OF THE EUROPEAN CERAMIC SOCIETY,41(15),7516-7524.
MLA	Tang, Jie,et al."The preparation of SiC ceramic photosensitive slurry for rapid stereolithography".JOURNAL OF THE EUROPEAN CERAMIC SOCIETY 41.15(2021):7516-7524.