| The preparation of SiC ceramic photosensitive slurry for rapid stereolithography | |
Tang, Jie1,2; Guo, Xiaotian1,2; Chang, Haotian1,2; Hu, Kehui3,4; Shen, Zhen5 ; Wang, Weixing; Liu, Meng1,2; Wei, Yuquan1,2; Huang, Zhengren1,2; Yang, Yong1,2
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| Source Publication | JOURNAL OF THE EUROPEAN CERAMIC SOCIETY
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| ISSN | 0955-2219 |
| 2021-12-01 | |
| Volume | 41Issue:15Pages:7516-7524 |
| Corresponding Author | Huang, Zhengren(zhrhuang@mail.sic.ac.cn) ; Yang, Yong(yangyong@mail.sic.ac.cn) |
| Abstract | Stereolithography is one of the most widely used additive manufacturing techniques for preparing high precision and complex ceramic components. Due to the high optical absorbance and refractive index of SiC powder, the rapid stereolithography of SiC ceramics components has become a key challenge. Here, we innovatively use graded silica to improve the curing thickness, rheological and settling performance of the slurry. And we presented a preparation method of SiC ceramic slurry for stereolithography with high solid content, low viscosity, low sedimentation rate and high curing thickness. The printable precision of the slurry is more than 75 mu m, the dynamic viscosity is less than 2 Pa.s, and the 24 h sedimentation height is less than 5%. This strategy demonstrates a tantalizing possibility and promising prospect to rapid stereolithography of large size SiC ceramic green body. |
| Keyword | Stereolithography Graded SiO2 3D printing SiC ceramic slurry |
| DOI | 10.1016/j.jeurceramsoc.2021.08.029 |
| WOS Keyword | MATRIX COMPOSITES ; FABRICATION ; INFILTRATION ; SUSPENSIONS ; BEHAVIOR ; SPACE |
| Indexed By | SCI |
| Language | 英语 |
| Funding Project | Research instrument development project of Chinese Academy of Sciences[YZQT014] |
| Funding Organization | Research instrument development project of Chinese Academy of Sciences |
| WOS Research Area | Materials Science |
| WOS Subject | Materials Science, Ceramics |
| WOS ID | WOS:000705188500005 |
| Publisher | ELSEVIER SCI LTD |
| Sub direction classification | 人工智能+制造 |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.ia.ac.cn/handle/173211/46168 |
| Collection | 复杂系统管理与控制国家重点实验室_平行智能技术与系统团队 |
| Corresponding Author | Huang, Zhengren; Yang, Yong |
| Affiliation | 1.Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine, Shanghai 200050, Peoples R China 2.Univ Chinese Acad Sci, Coll Mat Sci & Optoelect Technol, Beijing 100049, Peoples R China 3.Tsinghua Univ, State Key Lab Tribol, Beijing 100084, Peoples R China 4.Tsinghua Univ, Dept Mech Engn, Beijing 100084, Peoples R China 5.Chinese Acad Sci, Inst Automat, State Key Lab Management & Control Complex Syst, Beijing, Peoples R China |
| Recommended Citation GB/T 7714 | Tang, Jie,Guo, Xiaotian,Chang, Haotian,et al. The preparation of SiC ceramic photosensitive slurry for rapid stereolithography[J]. JOURNAL OF THE EUROPEAN CERAMIC SOCIETY,2021,41(15):7516-7524. |
| APA | Tang, Jie.,Guo, Xiaotian.,Chang, Haotian.,Hu, Kehui.,Shen, Zhen.,...&Yang, Yong.(2021).The preparation of SiC ceramic photosensitive slurry for rapid stereolithography.JOURNAL OF THE EUROPEAN CERAMIC SOCIETY,41(15),7516-7524. |
| MLA | Tang, Jie,et al."The preparation of SiC ceramic photosensitive slurry for rapid stereolithography".JOURNAL OF THE EUROPEAN CERAMIC SOCIETY 41.15(2021):7516-7524. |
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