The preparation of SiC ceramic photosensitive slurry for rapid stereolithography
Tang, Jie1,2; Guo, Xiaotian1,2; Chang, Haotian1,2; Hu, Kehui3,4; Shen, Zhen5; Wang, Weixing; Liu, Meng1,2; Wei, Yuquan1,2; Huang, Zhengren1,2; Yang, Yong1,2
Source PublicationJOURNAL OF THE EUROPEAN CERAMIC SOCIETY
ISSN0955-2219
2021-12-01
Volume41Issue:15Pages:7516-7524
Corresponding AuthorHuang, Zhengren(zhrhuang@mail.sic.ac.cn) ; Yang, Yong(yangyong@mail.sic.ac.cn)
AbstractStereolithography is one of the most widely used additive manufacturing techniques for preparing high precision and complex ceramic components. Due to the high optical absorbance and refractive index of SiC powder, the rapid stereolithography of SiC ceramics components has become a key challenge. Here, we innovatively use graded silica to improve the curing thickness, rheological and settling performance of the slurry. And we presented a preparation method of SiC ceramic slurry for stereolithography with high solid content, low viscosity, low sedimentation rate and high curing thickness. The printable precision of the slurry is more than 75 mu m, the dynamic viscosity is less than 2 Pa.s, and the 24 h sedimentation height is less than 5%. This strategy demonstrates a tantalizing possibility and promising prospect to rapid stereolithography of large size SiC ceramic green body.
KeywordStereolithography Graded SiO2 3D printing SiC ceramic slurry
DOI10.1016/j.jeurceramsoc.2021.08.029
WOS KeywordMATRIX COMPOSITES ; FABRICATION ; INFILTRATION ; SUSPENSIONS ; BEHAVIOR ; SPACE
Indexed BySCI
Language英语
Funding ProjectResearch instrument development project of Chinese Academy of Sciences[YZQT014]
Funding OrganizationResearch instrument development project of Chinese Academy of Sciences
WOS Research AreaMaterials Science
WOS SubjectMaterials Science, Ceramics
WOS IDWOS:000705188500005
PublisherELSEVIER SCI LTD
Sub direction classification人工智能+制造
Citation statistics
Cited Times:1[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.ia.ac.cn/handle/173211/46168
Collection复杂系统管理与控制国家重点实验室_平行智能技术与系统团队
Corresponding AuthorHuang, Zhengren; Yang, Yong
Affiliation1.Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine, Shanghai 200050, Peoples R China
2.Univ Chinese Acad Sci, Coll Mat Sci & Optoelect Technol, Beijing 100049, Peoples R China
3.Tsinghua Univ, State Key Lab Tribol, Beijing 100084, Peoples R China
4.Tsinghua Univ, Dept Mech Engn, Beijing 100084, Peoples R China
5.Chinese Acad Sci, Inst Automat, State Key Lab Management & Control Complex Syst, Beijing, Peoples R China
Recommended Citation
GB/T 7714
Tang, Jie,Guo, Xiaotian,Chang, Haotian,et al. The preparation of SiC ceramic photosensitive slurry for rapid stereolithography[J]. JOURNAL OF THE EUROPEAN CERAMIC SOCIETY,2021,41(15):7516-7524.
APA Tang, Jie.,Guo, Xiaotian.,Chang, Haotian.,Hu, Kehui.,Shen, Zhen.,...&Yang, Yong.(2021).The preparation of SiC ceramic photosensitive slurry for rapid stereolithography.JOURNAL OF THE EUROPEAN CERAMIC SOCIETY,41(15),7516-7524.
MLA Tang, Jie,et al."The preparation of SiC ceramic photosensitive slurry for rapid stereolithography".JOURNAL OF THE EUROPEAN CERAMIC SOCIETY 41.15(2021):7516-7524.
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