CASIA OpenIR  > 中国科学院分子影像重点实验室
一种激发荧光强度均匀校正方法
田捷; 薛贞文; 杨鑫; 秦承虎
2011-03-17
Date Available2011-09-07
CountryCN
Subtype发明
Abstract本发明涉及一种激发荧光强度均匀校正方法,所述方法的技术方案如下:利用光谱曲线相同的两片激发滤光片,一片放在激发光源出口,另一片放在CCD探测器前,经激发光照射物体时探测器获得第一图像;将放在CCD探测器前的滤光片换成发射滤光片,经激发光照射物体时探测器获得第二图像。接下来将第二图像中像素值除以第一图像中相应像素值获得中间校正图像。对中间校正图像进行归一化和取整处理得到最终校正图像。经过激发荧光强度均匀校正后的图像修正了受激发的物体表面接收激发光强度不均匀所带来的误差,因此能更真实地反映受激发的荧光图像。
Copyright Date2012-11-21
Patent NumberCN201110064845.3
Status授权
Document Type专利
Identifierhttp://ir.ia.ac.cn/handle/173211/8547
Collection中国科学院分子影像重点实验室
Affiliation中国科学院自动化研究所
Recommended Citation
GB/T 7714
田捷,薛贞文,杨鑫,等. 一种激发荧光强度均匀校正方法. CN201110064845.3[P]. 2011-03-17.
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